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Used Amat Endura 5500 is the 1 highly reliable physical vapor deposition platform with long-term market verification, providing cost-effective thin film deposition process solutions for small and medium-sized fabs. As the source manufacturer of key components of semiconductor high-end equipment, Chinsor Tech refuses any middleman to earn the difference. With strong independent technology accumulation, it provides you with highly competitive ex-factory price, fast delivery cycle and comprehensive technical upgrade support.
Used Amat Endura 5500 is mainly used in metallization process, barrier layer thin film deposition, silicide formation and surface coating processing of MEMS in integrated circuit manufacturing.
high-purity aluminum alloy is used to process the cavity as a whole, and the tolerance is controlled within 0: 02mm, which can reduce the leakage rate by 80%, ensure that the vacuum degree is always maintained at a very high level in continuous production, and greatly improve the process quality of high-purity thin film deposition.
equipped with high-precision ceramic heating plate, surface temperature difference control within plus or minus 2 degrees Celsius, effectively reduce the internal stress defects caused by uneven heating, compared with the traditional two-phone table to make the film deposition layer thickness uniformity increased by 35%.
the depth structure is optimized for the transmission module, the repeated positioning accuracy of the mechanical arm reaches 0.1mm, the debris rate and particle pollution in the transmission process are reduced by 90%, and the service life of the core components is extended by more than 2 years.
all matching high-precision spare parts have passed ISO 9001 certification. The key contact surface is made of high-temperature and corrosion-resistant special ceramics and high-purity metal materials, which improves the wear resistance by 2 times and greatly reduces the unplanned downtime of the production line.
equipped with a recalibrated mass flow controller, the gas flow control accuracy reaches plus or minus 1%, and the response time is shortened to less than 1 second, ensuring that the chemical ratio of multi-metal film deposition is highly accurate.
supports the modular replacement and upgrade of the lower cavity for specific etching or thin film processes, and can flexibly reconfigure the hardware according to the process requirements of different fabs, so that the old machine can regain the latest process capability at a very low cost of transformation.
Used Amat Endura 5500 is known in the industry for its high system stability and mature process matching. Compared with other ordinary second-hand mobile stations on the market that have not undergone in-depth renovation and technical upgrading, the equipment has been calibrated with precise geometric tolerances and fully optimized with vacuum system, and has reached the indexes close to those of the original new machine in terms of air tightness, transmission stability and process repeatability. In addition, with modular transformation capabilities, its subsequent maintenance and component upgrade costs are much lower than similar third-party refurbishment platforms in the market.
In view of the wear of transmission components, we have reconstructed and upgraded the arm positioning mechanism to solve the problem of frequent production line shutdown and debris loss caused by wafer jam and transmission misalignment.
in view of the corrosion of the sealing surface of the old machine chamber, we provide the overall replacement service of high-precision lower chamber, which solves the problem of process yield decline caused by the inability to maintain vacuum degree and excessive particles.
in response to the supply chain disconnection problem, we provide high-end metal and ceramic spare parts with completely independent technical reserves, solving the problem of high procurement costs and long downtime.
For companies that mainly produce diodes, transistors, integrated circuits or power devices and face budget constraints, this equipment can help them quickly expand the capacity of their mature 8-inch process lines at a low cost.
suitable for fabs engaged in the development of non-standard special processes such as sensors, microfluidic chips, optical components, etc., to provide highly stable and flexible metal film and barrier layer deposition process support.
suitable for equipment trading and technology service providers who are looking for high-quality second-hand sources and hardcore technology assembly supply chains around the world, so as to facilitate their secondary technology value-added and rapid delivery to end customers.
laboratories suitable for the teaching of advanced semiconductor technology, the research and development of thin film materials and the research of new generation semiconductor devices, meeting the strict requirements for high reliability and multi-process compatibility of equipment.
place the machine horizontally in a thousand-level clean room, connect high-purity process gas and cooling water pipelines, start the mechanical pump and molecular pump, and conduct 24-hour continuous vacuum pumping to ensure that the leakage rate of the cavity reaches the technical index.
special calibration wafers and tooling are used to adjust the axial and radial parameters of the mechanical arm through the control panel to ensure that the positioning accuracy reaches 0: 1mm until the wafers flow smoothly between the transmission chamber and the process chamber.
input the film deposition formula in the main control interface, including gas flow, RF power and deposition time, open the ceramic heating plate, so that the temperature of the process chamber reaches the preset process temperature and remains stable.
put into the crystal box and start the automatic processing program, monitor the pressure and gas flow fluctuation of each cavity, regularly check the sealing surface and replace the wear parts with high-purity cermet spare parts to ensure long-term stable operation.
certificate
Welcome to our Frequently Asked Questions page. We have compiled answers to common questions you may have, hoping to provide you with clear and quick solutions. If you cannot find the information you need here, please feel free to contact our customer support team.
8 inches
Wafer size
Up to 4 process cavities can be configured
Number of cavities
less than or equal to 10 minus 8 torr
Ultimate vacuum
Wuxi Zhanshuo