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With its highly flexible multi-chamber cluster architecture, Centura 5200 demonstrates excellent yield stability and process repeatability in CVD, etch and thermal processing of 8-inch wafers. As a source manufacturer in the semiconductor field for many years, Chinsor Tech not only provides original refurbished complete machines, but also relies on its own factories to realize the independent supply of core spare parts, ensuring that you can obtain long-term and reliable technical support at the most competitive ex-factory price.
Centura 5200 is mainly used in logic integrated circuit manufacturing, power device oxidation process, chemical vapor deposition film growth and silicon wafer rapid thermal processing.
The Centura 5200 platform supports the integration of multiple process chambers in a vacuum environment, which can handle CVD or etching tasks at the same time, effectively eliminating the risk of air pollution, and improving wafer cleanliness and production efficiency for multiple continuous processes.
advanced infrared lamp heating or closed-loop heating plate control system is adopted to ensure that the temperature field fluctuation inside the chamber is controlled within 0.5%, which significantly reduces the non-uniformity of film deposition resistivity and directly improves the consistency of electrical parameters of the terminal chip.
equipped with imported mass flow meter and ultra-high vacuum pump group, pressure adjustment response time is less than 1 second, can achieve accurate control of deposition rate and etching depth micron level, to meet the advanced process of high aspect ratio structure processing requirements.
Chinsor Tech uses its own 52 patented technologies to provide self-produced vacuum chambers, wafer heaters and shields for the equipment. The corrosion resistance is improved by 20%, which not only extends the maintenance cycle, but also greatly reduces the subsequent operating costs.
equipped with high-performance VHP manipulator, through the optimized motion control algorithm, while achieving 0.05mm repeat positioning accuracy, reducing the particle pollution caused by mechanical friction, effectively ensuring the high yield output of the 8-inch production line.
relying on Chinsor Tech’s professional HDPCVD equipment renovation project experience, we provide a complete plan from system reconstruction, software upgrade to on-site installation, so that the delivery cycle of used equipment can be shortened to half of that of traditional new machines on the basis of restoring to original factory performance.
Unlike ordinary traders who only do cosmetic cleaning, Chinsor Tech performs a full teardown-grade refurbishment of the Centura 5200’s core vacuum system and transmission mechanism. We utilize our own precision machining capabilities to perform surface reconstruction on the aged chamber, resulting in a vacuum leakage rate of over 15% better than the industry’s used standard. Relying on 11 software copyrights, Chinsor Tech can not only maintain the Centura 5200 hardware, but also modernize older control systems. By optimizing process formulation parameters, we ensure that the refurbished machine performs as well as some new-generation systems in terms of particle size when processing thin film deposition in complex media.
Due to the discontinuation of some original parts for this model, Chinsor Tech has solved the problem of customers not being able to find key vacuum parts and heating parts during the long-term maintenance of Centura 5200 through 52 patented spare parts developed in-house.
For customers who need to expand their 8-inch production capacity but are limited by their budget, we have solved the pain point of too long payback period for newly purchased machines by providing cost-effective refurbished complete machines, significantly improving the ROI of the production line.
With successful renovation experience in multiple projects such as the Wuxi Internet of Things Innovation Promotion Center, Chinsor Tech has solved the problem of difficult on-site process matching for customers and can provide pre-set mature process formulas, greatly shortening the time it takes for equipment to go online.
Suitable for manufacturers of power chips such as IGBTs and FRDs, the Centura 5200’s stable heat treatment and thin film performance can meet the stringent requirements for oxide layer quality of high-voltage power devices.
Suitable for foundries that need to process multiple varieties and small batches of 8-inch wafers. The platform’s multi-chamber configuration enables rapid process switching, greatly improving the scheduling flexibility of the production line.
Suitable for universities or research institutions, the Centura 5200 open cluster architecture facilitates the integration of various sensors and is an ideal experimental platform for the research and development of new material deposition processes.
Suitable for purchasing managers looking for long-term spare parts alternatives and equipment upgrade services, Chinsor Tech’s source factory identity can provide them with stable supply chain guarantees and cost optimization solutions.
after confirming that the pressure of cooling water and process gas is up to standard, start the main power supply through the console. Perform the robot calibration procedure to ensure that the robot’s drive path between each load lock and the process chamber is not offset.
before running the formal production formula, the dry pump and molecular pump shall be started, and the chamber shall be conditioned and tempered after the pressure drops to the set vacuum value. This step can effectively remove the water vapor and impurities adsorbed on the cavity wall.
The corresponding CVD or heat treatment parameters are loaded through the graphical interface. The RF power, reflected power and gas flow should be closely monitored during operation to ensure that the real-time data is at the center of the process window.
According to the number of wafer passes recorded by the system, the shields and seals produced by Chinsor Tech are regularly replaced. Check the oil level of the vacuum pump and clean the dust on the transfer arm to prevent excessive particles.
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Welcome to our Frequently Asked Questions page. We have compiled answers to common questions you may have, hoping to provide you with clear and quick solutions. If you cannot find the information you need here, please feel free to contact our customer support team.
200mm
Wafer size
Up to 4 process chambers
Number of chambers
10 minus 7 torr
Vacuum pressure
Wuxi Zhanshuo