1. Identify The Chamber RoleStart with process, cooldown, degas, transfer or etch duty. The role narrows the assembly family before dimensional review.
2. Keep The Full Part IdentityRecord the complete part number, revision letter and suffix. A shortened number can point to a different build.
3. Confirm The Tool ConfigurationState the platform, process family and wafer size. The same platform name can contain PVD, CVD and ETCH configurations that are not interchangeable.
4. Attach Installed EvidenceUse nameplate and old-part photos, port and sealing-face views, drawings or verified installation records. Chinsortech then confirms what can enter the quotation.
Process ChambersCVD and etch chambers perform the wafer process itself. Recipe, internal hardware, material exposure and contamination control make the exact process configuration decisive.
Support ChambersDegas chambers remove volatile contamination before a sensitive step, while cooldown chambers reduce wafer temperature after processing. They require their own heater, slot and interface review.
Transfer ChambersTransfer chambers move wafers between modules under controlled vacuum. Robot reach, slit-valve location, sealing geometry and installed layout govern the fit.
Integrated Platform ContextCentura, Endura, Producer and newer platforms can combine several chamber types around one mainframe. A platform family therefore guides the search but does not prove interchangeability.
DXZ SiN chamber assembly for a Centura 5200 DCVD fit review based on full part identity.0290-35673-01 DXZ Silicon Nitride Chamber Assembly 2nd Source NewThis assembly supports a CVD chamber fit review when the complete part number and installed Centura configuration are available.Application / fitCVD; Centura 5200 DCVDWafer / range basis200 mm (7.87 in); installed-tool matchMaterialMachined aluminum; alloy/finish to drawingInterface standardPN, ports and sealing facesRequest a QuoteOnline chatProduct details
Process chamber body for a drawing-led fit review using the full part identity and installed geometry.215-00042-000-A05 Process Chamber 2nd Source NewThis process chamber suits cases where the part identity is known and the installed platform and process configuration are documented with the inquiry.Application / fitCVD; platform to confirmPressure / load rangeRecipe and drawing dependentMaterialMachined aluminum; alloy/finish to drawingInterface standardPN and confirmed port/seal geometryRequest a QuoteOnline chatProduct details
Multi-slot cooldown chamber assembly mapped to Centura 5200 DCVD for post-process wafer cooling.0010-37264 Cooldown Chamber Multi Slot Ass'y 2nd Source NewThe mapped fit is Centura 5200 DCVD cooldown duty, with slot layout and installed interfaces included in the engineering match.Application / fitCVD cooldown; Centura 5200 DCVDWafer / range basis200 mm (7.87 in); slot-layout matchMaterialMachined aluminum assembly; internals to drawingInterface standardPN, slot layout and tool interfacesRequest a QuoteOnline chatProduct details
Degas chamber mapped to Endura 5500 PVD for pre-process outgassing support.0020-70376 Degas Chamber 2nd Source NewThe mapped fit is Endura 5500 PVD degas duty, with heater, chamber and interface configuration included in the engineering match.Application / fitPVD degas; Endura 5500 PVDWafer / range basis200 mm (7.87 in); installed-tool matchMaterialMachined aluminum; heater details to drawingInterface standardPN and Endura degas interfacesRequest a QuoteOnline chatProduct details
Transfer chamber for vacuum wafer movement on the customer-mapped Endura 5500 PVD configuration.0040-49834-003 Transfer Chamber 2nd Source NewThe mapped Endura transfer position is defined by robot reach, slit-valve geometry and the installed layout.Application / fitCVD/ETCH transfer; Endura 5500 PVDWafer / range basis200 mm (7.87 in); installed-layout matchMaterialMachined aluminum vacuum body; finish to drawingInterface standardPN, slit valve and robot geometryRequest a QuoteOnline chatProduct details
Unibody etch chamber for P5000, with the 0040-09723 versus 0040-09723-C revision confirmed before release.0040-09723 Unibody Etch Chamber 2nd Source NewThe P5000 etch fit retains a revision check because the supplied detail page shows 0040-09723 while the verified product record lists 0040-09723-C.Application / fitETCH; P5000Wafer / range basis200 mm (7.87 in); revision matchMaterialMachined aluminum unibody; liner/finish to drawingInterface standardVisible PN plus REV C checkRequest a QuoteOnline chatProduct details
Engineering Review / 1 AssemblyMOQ 1 assembly. Price follows part, revision, quantity and drawing review; a validation unit is charged.
Small Order / 2–4 AssembliesVolume-based quotation, final inspection and export packing; target production 25–35 business days after approval.
Repeat Supply / 5+ AssembliesNegotiated price basis and capacity scheduling; replenishment target 30–45 business days after specification freeze.
Made To Order / 20–45 Business DaysSchedule begins after drawing, material, process and commercial approval. The formal quotation confirms the actual lead time.
Worldwide Export / EXW, FOB Or CIFWorldwide shipment uses an agreed forwarder. CIF quotations use the destination port and destination restrictions recorded in the RFQ.
Shipment DocumentsCommercial invoice, packing list and final inspection report. Material or special traceability documents are supplied only when agreed in the order.