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We provide precision process components and equipment refurbishment services for AMAT PVD platforms. The core selling point is to ensure excellent uniformity and high vacuum stability of thin film deposition through high-purity materials and ultra-precision processing. As a source manufacturing plant with its own production base, Zhanshuo Technology has a complete metal and ceramic processing line, which can skip the intermediate links and provide global customers with highly competitive direct selling prices and fast technical support.
AMAT PVD core components are widely used in semiconductor integrated circuit manufacturing, advanced wafer level packaging, metal interconnect deposition, and high reliability power device production.
The surface flatness of the heating plate is controlled within 0.005mm to ensure that the wafer is heated extremely evenly during the deposition process, effectively reducing film defects caused by thermal stress and improving the yield.
aluminum alloy and high-performance ceramic materials with a purity of up to 99.999% are used to minimize metal ion pollution in the cavity and meet the strict requirements of advanced process nodes on environmental cleanliness.
The key sealing surface is specially polished, and the vacuum leakage rate is less than 1.0 E-9 cubic centimeters per second, which can maintain a stable ultra-high vacuum environment for a long time and significantly improve production efficiency.
By improving the contact structure between the sputtering cathode and the back plate, the contact resistance is reduced and the discharge stability is improved, the fluctuation of the deposition rate is controlled within 2%, and the process repeatability is enhanced.
the surface of the internal parts of the cavity is specially anodized or ceramic sprayed, which has strong plasma etching resistance, can extend the maintenance period by more than 40% and reduce the operation and maintenance cost.
all parts are strictly in accordance with the original specifications for 1: 1 precision mapping and production, to ensure that the Endura platform to achieve zero modification direct installation, greatly shorten the equipment downtime debugging time.
Chinsor Tech’s AMAT PVD key components control the wafer surface temperature difference to within plus or minus 2 degrees Celsius by optimizing the thermal field simulation model, far exceeding the industry standard. Compared with similar products, we use more advanced ceramic bonding technology, so that the heating components in high and low temperature frequent cycles can still maintain a high structural integrity, to prevent the process of ceramic cracking caused by interruption.
Chinsor Tech solves the common problem of excessive edge deposition rate in PVD process through nano-scale surface treatment technology, ensuring excellent global consistency of film thickness.
In view of the problem that ordinary spare parts are susceptible to corrosion, we have enhanced the plasma impact resistance of the parts and solved the problem of low equipment operation rate caused by frequent replacement of consumables.
In view of the current situation of AMAT’s early model spare parts discontinuation, Chinsor Tech provides complete reverse engineering and customized production services to solve the risk of outage and downtime faced by old machines.
Specifically responsible for improving the stability of Endura or Centura machines, and needs to find high-quality, high-performance and fast-delivery domestic replacement parts solutions.
engaged in advanced material thin film deposition research, PVD cavity thermal field distribution, vacuum degree and impurity control has very high requirements of professional and technical personnel.
need to bulk purchase cost-effective, highly compatible PVD core modules for the upgrading of old machines to enhance the market competitiveness of second-hand equipment.
aims to diversify the supply chain, reduce dependence on a single original factory channel, and seek source factories with independent research and development capabilities and strict quality control systems.
ensure that the installation environment is in a dust-free workshop above grade 10,000, and check whether the parts are packaged in good condition. Use alcohol to wipe the connection twice to ensure that there are no visible particles.
when installing the sealing ring, a very small amount of high-performance vacuum silicone grease should be evenly applied, and the bolts should be fastened diagonally to ensure that the chamber is evenly stressed and reaches the predetermined vacuum degree.
After starting for the first time or replacing the heating plate, it is recommended to carry out a step-by-step heating cycle, each time the temperature is raised by 50 degrees Celsius and kept for 15 minutes until the set process temperature is reached.
after each maintenance cycle, it is necessary to check the particle adhesion of the deposition shielding cover, and use special measuring tools to detect the flatness of the heating plate to ensure the process stability.
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Welcome to our Frequently Asked Questions page. We have compiled answers to common questions you may have, hoping to provide you with clear and quick solutions. If you cannot find the information you need here, please feel free to contact our customer support team.
100.00%
Material purity
0.005mm
Flatness
450 degrees Celsius
Working temperature
Wuxi Zhanshuo