Ultima HDP-CVD Chamber ReplacementReplacement of chamber body 0040-04745 on a documented Centura 5200 HDP-CVD configuration.
Fab Spare-Part PlanningA new 2nd-source body for scheduled maintenance or obsolescence coverage where the installed part and revision are recorded.
Chamber Rebuild ProjectsA replacement body for qualified rebuild work when lid, pumping, slit-valve and mounting interfaces match the existing assembly.
Material GradeChamber-grade aluminum alloy selected to match the approved 0040-04745 drawing or sample.
Manufacturing ProcessCNC rough and finish machining, interface finishing, controlled cleaning and staged dimensional inspection.
Surface FinishingPrecision-machined sealing surfaces; anodizing or other treatment only when required by the approved configuration.
Working MediumHDP-CVD dielectric-deposition chamber environment with process-specific residue controls.
Temperature BoundaryInstalled-system operating window; the chamber body has no independent process-temperature rating.
Pressure And LoadHigh-vacuum chamber service within the original Centura lid, pumping and mounting architecture.
Installation LimitUse only for configurations matching 0040-04745; not interchangeable with DXZ, TXZ, DPS, etch or other Centura bodies.
Geometry replicationmanufacture from an approved drawing, old-body sample or controlled measurement record.
Interface configurationreproduce lid, slit-valve, pumping, gas and mounting features defined in the release package.
Material and finishmatch the specified aluminum grade and surface treatment for the recorded chamber configuration.
Identificationapply customer part, batch and inspection-status marking required by the purchase order.
Inspection packagedimensional report, material record and leak-test evidence can be included in the quoted scope.
Packagingclean sealed bagging, interface protection and export-crate labeling can follow the buyer's handling plan.
01Verify The Installed ConfigurationMatch PN 0040-04745, Ultima HDP-CVD chamber identity, wafer-size context and revision. Quarantine the old body if process residue or transport damage is present.
02Install Under The Current Service ProcedureAuthorized technicians must decontaminate the chamber, isolate hazardous energy, use rated lifting support, fit approved seals and apply the torque sequence from the matching service document.
03Qualify Vacuum And InterfacesComplete the approved leak test, pump-down baseline, cooling, gas, RF and transfer-interface checks before process release. Stop if leakage, arcing, abnormal particles or interface movement is detected.
04Clean, Inspect And RecordUse chemistry compatible with the recorded process residue and aluminum finish. Inspect sealing faces and wear areas, dry the body fully, record the maintenance event and seal it for storage.
Before OrderingReview 0040-04745, installed Centura 5200 HDP-CVD configuration, wafer-size context, revision, old-part photos and available drawings.
During ProductionApply incoming-material, in-process and final inspection gates; rejected work is reworked and re-inspected before release.
After DeliveryProvide shipment records, answer interface questions, review documented nonconformance and retain the part/batch basis for repeat supply.
CHAMBER BODY, TXZ MCVD 2nd Source NewTXZ MCVD chamber-body family for a different documented CVD configuration.
Housing, Lower Reaction ChamberLower reaction-chamber housing; select only by its own equipment and part record.
DHSG, LWR RCTN CHMBR, ENH 2nd Source NewEnhanced lower reaction-chamber housing for a separate chamber architecture.
Chamber Body HDP-CVD 2nd Source NewAnother HDP-CVD chamber body; part-level compatibility must remain separate from 0040-04745.
Wuxi Zhanshuo