A Platform Name Cannot Lock The Chamber ConfigurationPrecision 5000 equipment carried different process, wafer-size and hardware configurations. A P5000 label alone does not establish the gas, cooling, sealing or mounting interfaces.
0040-09723-C Anchors The Replacement ReleasePart number 0040-09723-C, the etch process, hardware revision, ports, sealing faces and mounting pattern must agree before the replacement is released.
Fit And Seal Checks Protect The First Pump-DownCritical datums, sealing faces, ports and mounting geometry are inspected before a helium-leak check verifies the assembled vacuum boundary.
Clean Surfaces And Protected Packing Support QualificationCritical dimensions, sealing faces, cleaned internal surfaces, protected packing and helium-leak performance must pass before the chamber enters process qualification.
01Applied Materials Precision 5000 Etch ToolsThe chamber forms the controlled vacuum process space for the matching P5000 etch configuration. Part number, process, revision and interfaces remain the compatibility boundary.
02Legacy 150 mm And 200 mm Platform SupportP5000 was used across more than one wafer-size and process configuration. This chamber is released only after the installed etch chamber and revision match.
03Planned Spare And Chamber ReplacementThe new second-source chamber supports scheduled maintenance, damaged-body replacement and legacy-tool spare planning when the removed chamber, equipment record or drawing establishes the fit.
Precision Cast Aluminum PlateThe chamber body uses precision cast aluminum plate with an EN 573-3 material basis for stable machining and corrosion-resistant service.
CNC-Machined Ports, Passages And DatumsRough and finish machining establishes chamber geometry, gas ports, cooling passages, sealing faces and mounting datums before inspection.
Hard-Anodized Plasma-Facing SurfacesSpecified internal aluminum surfaces receive hard anodizing while sealing faces and interfaces remain protected to the released chamber specification.
01Isolate Vacuum, Gas, RF, Power And CoolingVent and lock out the tool, isolate process gases, RF and electrical power, drain or isolate cooling circuits, and verify zero stored energy before chamber removal.
02Match Ports, Seals And Mounting DatumsCompare the full part number and revision with the removed chamber. Protect sealing faces, install approved seals, align connections without force, and use the tool fastener sequence and torque.
03Leak-Check Before Process QualificationComplete a controlled pump-down, helium-leak test, cooling-circuit check and utility verification before RF or process gas operation.
04Protect Anodized Surfaces During Cleaning And StorageUse approved non-abrasive cleaning materials, inspect sealing faces and ports, cap open connections, and store the dry chamber in clean protective packaging.
Complete Identity Review Before QuotationThe review covers the full part number, revision, installed etch chamber, wafer configuration, ports, sealing faces and available drawing or removed-part photos.
Batch-Linked Manufacturing And Inspection UpdatesMaterial, machining, anodizing, cleaning, dimensional inspection and leak verification remain linked to one manufacturing batch, with packing details confirmed before shipment.
Installation Feedback And Nonconformity DispositionSupport covers installation-fit review, vacuum-leak troubleshooting, transport-damage inspection and a documented disposition for manufacturing nonconformities or repeat supply.
0040-09001 Standard 4-6 Inch Chamber BodyA P5000 CVD chamber body for a different process configuration and part identity.
0040-34865 DGDP Chamber Liner, 200 mmA waffle-less 200 mm liner used inside a different etch-chamber configuration.
0040-31942 P5000 Oxide Etch Chamber BodyA P5000 200 mm oxide-etch chamber body with a side-gas-feed configuration.
0040-09893 R2 Edges Gas-Feed Chamber BodyAn R2 edges gas-feed chamber body with its own interface and revision boundary.
Wuxi Zhanshuo